In the core of Pulsedeon’s technology is thin-film coating technique called pulsed laser deposition (PLD). The technology and processes, as well as materials, applications and products are protected by IPR.

The basic principle of PLD is straightforward:

1.    Laser pulses are directed to a source material (target)

2.    Coating material is released from the target

3.    The released material is collected on the surface of the object to be coated (substrate)

The process usually takes place in a  chamber in vacuum conditions or in the presence of a background gas.

In order to spread coating material over larger surface areas, the laser pulses are scanned on the surface of the target, and the substrate is transported through the material flow released from the target. Pulsedeon utilizes various advanced laser scanning techniques optimized to provide the required quality and throughput.

Producing a coating or a layer of material with the desired properties requires control over all the parameters and properties related to, for example, the laser pulses, target, substrate, atmosphere, and deposition geometry. The optimal deposition conditions are different for each material and process, and Pulsedeon’s technology offers a versatile platform for developing and realizing material layers for various applications. And what is more, these processes are designed and developed with large volume industrial production in mind with straightforward and cost-effective upscaling possibilities.

Pulsedeon proprietaty Lighthouse PLD
Pulsedeon proprietaty Lighthouse PLD
Pulsedeon proprietaty Lighthouse PLD process arrangement: Roll-to-roll arrangement for anode coating

Pulsedeon proprietaty Lighthouse PLD process arrangement: Roll-to-roll arrangement for anode coating


PLD has several advantages as a deposition process:

·   In material transfer from target to substrate, it can preserve the target composition and stoichiometry.

This is required in the deposition of multi-element materials found for example in LIBs.

·   Adhesion between the coating and substrate is excellent.

·   Materials can be deposited at low temperatures close to room temperature.

The coating can be applied on sensitive substrates such as thin polymer membranes.

·   The deposition conditions can be adjusted independently.

·   Availability of lasers with different properties gives the possibility to optimize laser-target interactions for each material and process.


S2 Deposition tool chamber

S2 Deposition tool